1. Work with the team to develop temperature control models for RTP （Rapid Thermal Process） system. 协同其他研发团队成员，参与开发快速热退火设备温度测量和控制系统。 2. Develop temperature measurement systems from high to low temperature, detection with difference wafer optical property and robust systems for new annealing, oxidation/nitridation, plasma oxidation/nitridation, application. 开发不同温度范围的温度测量，控制系统，能够满足硅氧化膜，氮化膜和多晶硅等不同膜的温度精确测量和控制。 3. Develop wafer mode for cross wafer tuning and CIP development to meet process requirements. 根据工艺要求，开发研发晶圆不同半径区域内可调节的温度控制系统，以及对现有工艺的持续改善。 4. Developed mathematical models to optimize process parameters, achieving improvement in product consistency. 参与建立相关的数学模型，用于工艺质量的提升。 5. Support customers to solve problems related to temperature measurement, process optimization, as long as new product development. 支持客户端,包括但不限于现有问题解决，工艺优化，新产品开发需求。

1. At least MS in Optics Engineering, Maths or related major. PhD is preferred. 光电，数学相关专业，硕士以上学历,博士优先考虑。 2. Quick learner with the ability to grasp things quickly, is passionate about developing new systems. 有兴趣从事半导体设备研发工作，并且有能力学习技术前沿知识。 3. Demonstrated research experience, in a technical environment, with strong trouble-shooting skills. 具有较强的技术研究能力，数据分析总结能力；具有较强的分析问题解决问题的能力。 4. Excellent English communication skills （verbal, written）, data analysis and coding skills. 较强的英语听说读写能力。 5. Must be able to work independently under pressure in a highly dynamic environment. 具有较强的工作抗压能力。